Metal Sputtering Target Market

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. Metal Target Materials are kinds of sputtering targets and Metal Sputtering Target Market studies the Metal Target Material.

A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

Metal Sputtering Target Market contains market size and forecasts of Metal Sputtering Target in Global, including the following market information:

• Global Metal Sputtering Target Market Revenue, 2017-2022, 2023-2028, ($ millions)
• Global top five companies in 2021 (%)

The global Metal Sputtering Target market was valued at 3494.1 million in 2021 and is projected to reach US$ 5711.8 million by 2028, at a CAGR of 7.3% during the forecast period.

The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.

Metal Target Segment to Reach $ Million by 2028, with a % CAGR in next six years.

The global key manufacturers of Metal Sputtering Target include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Hitachi Metals, Honeywell, Mitsui Mining & Smelting, Sumitomo Chemical and ULVAC, etc. In 2021, the global top five players have a share approximately % in terms of revenue.

We surveyed the Metal Sputtering Target companies, and industry experts on this industry, involving the revenue, demand, product type, recent developments and plans, industry trends, drivers, challenges, obstacles, and potential risks.

Total Market by Segment:

Global Metal Sputtering Target Market, by Type, 2017-2022, 2023-2028 ($ millions)

Global Metal Sputtering Target Market Segment Percentages, by Type, 2021 (%)

• Metal Target
• Alloy Target

Global Metal Sputtering Target Market, by Application, 2017-2022, 2023-2028 ($ millions)

Global Metal Sputtering Target Market Segment Percentages, by Application, 2021 (%)

• Semiconductor
• Solar Energy
• Flat Panel Display
• Others

Global Metal Sputtering Target Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions)

Global Metal Sputtering Target Market Segment Percentages, By Region and Country, 2021 (%)

• North America
• US
• Canada
• Mexico
• Europe
• Germany
• France
• U.K.
• Italy
• Russia
• Nordic Countries
• Benelux
• Rest of Europe
• Asia
• China
• Japan
• South Korea
• Southeast Asia
• India
• Rest of Asia
• South America
• Brazil
• Argentina
• Rest of South America
• Middle East & Africa
• Turkey
• Israel
• Saudi Arabia
• UAE
• Rest of Middle East & Africa

Competitor Analysis

The report also provides analysis of leading market participants including:

• Key companies Metal Sputtering Target revenues in global market, 2017-2022 (estimated), ($ millions)
• Key companies Metal Sputtering Target revenues share in global market, 2021 (%)

Further, the report presents profiles of competitors in the market, key players include:

• Materion (Heraeus)
• JX Nippon Mining & Metals Corporation
• Praxair
• Plansee SE
• Hitachi Metals
• Honeywell
• Mitsui Mining & Smelting
• Sumitomo Chemical
• ULVAC
• TOSOH
• Ningbo Jiangfeng
• Heesung
• Luvata
• Fujian Acetron New Materials
• Changzhou Sujing Electronic Material
• Luoyang Sifon Electronic Materials
• GRIKIN Advanced Material
• FURAYA Metals
• Advantec
• Angstrom Sciences
• Umicore Thin Film Products