Sputtering Target for Semiconductor Market

The sputtering target material is the core of semiconductor wafer manufacturing, and the chip has very high requirements for sputtering target material, which requires high purity of target material, generally over 99.999%.

Sputtering Target for Semiconductor Market contains market size and forecasts of Sputtering Target for Semiconductor in global, including the following market information:

• Global Sputtering Target for Semiconductor Market Revenue, 2017-2022, 2023-2028, ($ millions)
• Global Sputtering Target for Semiconductor Market Sales, 2017-2022, 2023-2028, (Tons)
• Global top five Sputtering Target for Semiconductor companies in 2021 (%)

The global Sputtering Target for Semiconductor market was valued at 1678.9 million in 2021 and is projected to reach US$ 2389 million by 2028, at a CAGR of 5.2% during the forecast period.

The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.

Metal Target Segment to Reach $ Million by 2028, with a % CAGR in next six years.

The global key manufacturers of Sputtering Target for Semiconductor include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Hitachi Metals, Honeywell, TOSOH, Sumitomo Chemical and ULVAC, etc. In 2021, the global top five players have a share approximately % in terms of revenue.

We surveyed the Sputtering Target for Semiconductor manufacturers, suppliers, distributors and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks.

Total Market by Segment:

Global Sputtering Target for Semiconductor Market, by Type, 2017-2022, 2023-2028 ($ Millions) & (Tons)

Global Sputtering Target for Semiconductor Market Segment Percentages, by Type, 2021 (%)

• Metal Target
• Alloy Target
• Ceramic Compound Target

Global Sputtering Target for Semiconductor Market, by Application, 2017-2022, 2023-2028 ($ Millions) & (Tons)

Global Sputtering Target for Semiconductor Market Segment Percentages, by Application, 2021 (%)

• Consumer Electronics
• Vehicle Electronics
• Communication Electronics
• Others

Global Sputtering Target for Semiconductor Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions) & (Tons)

Global Sputtering Target for Semiconductor Market Segment Percentages, By Region and Country, 2021 (%)

• North America
• US
• Canada
• Mexico
• Europe
• Germany
• France
• U.K.
• Italy
• Russia
• Nordic Countries
• Benelux
• Rest of Europe
• Asia
• China
• Japan
• South Korea
• Southeast Asia
• India
• Rest of Asia
• South America
• Brazil
• Argentina
• Rest of South America
• Middle East & Africa
• Turkey
• Israel
• Saudi Arabia
• UAE
• Rest of Middle East & Africa

Competitor Analysis

The report also provides analysis of leading market participants including:

• Key companies Sputtering Target for Semiconductor revenues in global market, 2017-2022 (Estimated), ($ millions)
• Key companies Sputtering Target for Semiconductor revenues share in global market, 2021 (%)
• Key companies Sputtering Target for Semiconductor sales in global market, 2017-2022 (Estimated), (Tons)
• Key companies Sputtering Target for Semiconductor sales share in global market, 2021 (%)

Further, the report presents profiles of competitors in the market, key players include:

• Materion (Heraeus)
• JX Nippon Mining & Metals Corporation
• Praxair
• Plansee SE
• Hitachi Metals
• Honeywell
• TOSOH
• Sumitomo Chemical
• ULVAC
• Ningbo Jiangfeng
• Luvata
• GRIKIN Advanced Material
• Luoyang Sifon Electronic Materials
• FURAYA Metals
• Advantec
• Fujian Acetron New Materials Co., Ltd
• Umicore Thin Film Products
• Angstrom Sciences
• Changzhou Sujing Electronic Material